Solution-based "bottom-up" synthesis of group VI transition metal dichalcogenides and their applications
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2021Access:
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Coogan, Áine, Gun'ko, Yurii K., Solution-based "bottom-up" synthesis of group VI transition metal dichalcogenides and their applications, Materials Advances, 2021, 2, 146Download Item:
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Abstract:
Research interest in the area of transition metal dichalcogenide (TMD) nanostructures has significantly
increased in recent years. This interest is driven by their exceptional properties (e.g. semiconductor
state, electronic confinement, conductivity, flexibility, transparency, large surface area, etc.) and their
potential applications as materials for catalysis, photonics, sensing, solid lubrication, energy storage, high
performance electronics, imaging, medical diagnostics and drug delivery systems, to name a few. The
most common methods of production of these nanomaterials are ‘‘top-down’’ techniques involving
solution-phase exfoliation or mechanical microcleavage, or chemical vapour deposition, a ‘‘bottom-up’’
approach. However, these methods suffer from a number of drawbacks, including poor controllability
over size, high cost, and lack of scalability, thus limiting their potential commercial use. Therefore, over
the last number of years, solution-based ‘‘bottom-up’’ synthesis of TMDs is gaining much attention as it
can provide solutions to these problems. This review focuses on ‘‘bottom-up’’ methods such as hydro/
solvothermal, hot-injection and other approaches which have the potential to produce high-quality TMD
nanostructures with controllable properties such as size, phase, morphology, and at low-cost. Here, we
consider and compare various ‘‘bottom-up’’ synthetic techniques for synthesis of TMD nanostructures, explore
some potential applications of corresponding colloidal TMD materials and provide future outlook for this fast-
developing and important area.
Sponsor
Grant Number
Science Foundation Ireland (SFI)
SFI 16/RC/388
Author's Homepage:
http://people.tcd.ie/igounkoDescription:
PUBLISHED
Author: Gounko, Iouri; Coogan, Áine
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Materials Advances;Availability:
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10.1039/d0ma00697aLicences: