Nanogaps with very large aspect ratios for electrical measurements
Citation:
Fursina, A.; Lee, S.; Sofin, R. G. S.; Shvets, I. V.; Natelson, D., Nanogaps with very large aspect ratios for electrical measurements, Applied Physics Letters, 92, 11, 2008, 133102Download Item:
Abstract:
For nanoscale electrical characterization and device fabrication, it is often desirable to fabricate planar metal electrodes separated by large aspect ratio gaps with interelectrode distances well below 100?nm. We demonstrate a self-aligned process to accomplish this goal using a thin Cr film as a sacrificial etch layer. The resulting gaps can be as small as 10?nm and have aspect ratios exceeding 1000, with excellent interelectrode isolation. Such Ti/Au electrodes are demonstrated on Si substrates and are used to examine a voltage-driven transition in magnetite nanostructures. This shows the utility of this fabrication approach even with relatively reactive substrates.
Sponsor
Grant Number
Science Foundation Ireland (SFI)
Author's Homepage:
http://people.tcd.ie/ivchvetsDescription:
PUBLISHED
Author: SHVETS, IGOR
Type of material:
Journal ArticleCollections
Series/Report no:
Applied Physics Letters92
11
Availability:
Full text availableKeywords:
Atomic, molecular and chemical physics, thin filmsMetadata
Show full item recordLicences: