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dc.contributor.authorCOEY, JOHNen
dc.contributor.authorFENG, JIA-FENGen
dc.contributor.authorDIAO, ZHUen
dc.contributor.authorKURT, HUSEYINen
dc.date.accessioned2010-06-28T16:30:02Z
dc.date.available2010-06-28T16:30:02Z
dc.date.issued2010en
dc.date.submitted2010en
dc.identifier.citationDiao, Z.; Feng, J. F.; Kurt, H.; Feng, G.; Coey, J. M. D., Reduced low frequency noise in electron beam evaporated MgO magnetic tunnel junctions, Applied Physics Letters, 96, 20, 2010, 202506en
dc.identifier.otherYen
dc.identifier.urihttp://hdl.handle.net/2262/40216
dc.descriptionPUBLISHEDen
dc.description.abstractWe compare low frequency noise in magnetic tunnel junctions with MgO barriers prepared by electron-beam evaporation with those prepared by radiofrequency sputtering, both showing a high tunneling magnetoresistance. The normalized noise parameter in the parallel state of junctions with evaporated barriers is at least one order of magnitude lower than that in junctions with sputtered barriers, and exhibits a weaker bias dependence. The lowest normalized noise is in the 10(-11) mu m(2) range. A lower density of oxygen vacancies acting as charge trap states in the evaporated MgO is responsible for the lower noise.en
dc.description.sponsorshipThis work was supported by Science Foundation Ireland as part of the MANSE Project No. 05/IN/1850. Some support was also provided by Enterprise Ireland, as part of the "Spincurrents" FoNE network.en
dc.format.extent202506en
dc.language.isoenen
dc.relation.ispartofseriesApplied Physics Lettersen
dc.relation.ispartofseries96en
dc.relation.ispartofseries20en
dc.rightsYen
dc.subjectMAGNETICSen
dc.subjectMAGNETORESISTANCEen
dc.titleReduced low frequency noise in electron beam evaporated MgO magnetic tunnel junctionsen
dc.typeJournal Articleen
dc.contributor.sponsorScience Foundation Ireland (SFI)en
dc.type.supercollectionscholarly_publicationsen
dc.type.supercollectionrefereed_publicationsen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/jcoeyen
dc.identifier.rssinternalid67345en
dc.subject.TCDThemeNanoscience & Materialsen
dc.identifier.rssurihttp://dx.doi.org/10.1063/1.3431620en


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