Tailoring magnetoresistance at the atomic level: An ab initio study

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Kun Tao, V.S. Stepanyuk, I. Rungger and S. Sanvito, Tailoring magnetoresistance at the atomic level: An ab initio study, Physical Review B, 85, 4, 2012, 045406-

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The possibility of manipulating the tunneling magnetoresistance (TMR) of antiferromagnetic nanostructures is predicted in the framework of ab initio calculations. By the example of a junction composed of an antiferromagnetic dimer and a spin-polarized scanning tunneling microscopy tip we show that the TMR can be tuned and even reversed in sign by lateral and vertical movements of the tip. Moreover, our finite-bias calculations demonstrate that the magnitude and the sign of the TMR can also be tuned by an external voltage.

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Sponsor: Science Foundation Ireland (SFI)
Grant Number: G20267

Type of material: Journal Article