Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography
Citation:
Rasappa, Sozaraj, Schulte, Lars, Borah, Dipu, Morris, Michael A. Ndoni, Sokol, Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography, Colloids and Interface Science Communications, 2, 0, 2014, 1 - 5Download Item:
Abstract:
Block copolymers (BCP) are highly promising self-assembling precursors for scalable nanolithography. Very regular BCP nanopatterns can be used as on-chip etch masks. The first step in the processing of BCP thin films is usually the chemical modification of the substrate surface, typically by grafting of a brush layer that renders the surface energy neutral relative to the constituent blocks. We provide here a first study on rapid, low temperature self-assembly of PS-b-PDMS (polystyrene-block-polydimethylsiloxane) on silicon substrates without a brush layer. We show that it forms line and antidot patterns after short solvo-thermal annealing. Unlike previous reports on this system, low temperature and short annealing time provide self-assembly in homogeneous thin films covering large substrate areas. This on-chip mask was then used for pattern transfer to the underlying silicon substrate. SEM (scanning electron microscope) images reveal silicon nanowires relative to the PDMS patterns of the BCP mask.
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http://people.tcd.ie/morrism2Description:
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Author: MORRIS, MICHAEL
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Journal ArticleSeries/Report no:
Colloids and Interface Science Communications2
0
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Full text availableKeywords:
Self-assembly, PS-b-PDMS, Silicon nanostructures, Solvo-thermal annealing, Brushless, Soft mask template, Dry etching, Pattern transfer;, Lines and antidots, Aspect ratioDOI:
http://dx.doi.org/10.1016/j.colcom.2014.07.001Metadata
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