Plasma-Assisted Simultaneous Reduction and Nitrogen Doping of Graphene Oxide Nanosheets
Citation:
Nanjundan Ashok Kumar, Hugo Nolan, Niall McEvoy, Ehsan Rezvani, Richard L. Doyle, Michael E. G. Lyons and Georg S. Duesberg, Plasma-Assisted Simultaneous Reduction and Nitrogen Doping of Graphene Oxide Nanosheets, Journal of Materials Chemistry A, 1, 2013, 4431 - 4435Abstract:
An environmentally benign and scalable route for the production of gram scale quantities of nitrogen-doped graphene using a downstream microwave plasma source is reported. Simultaneous reduction and doping of graphene oxide is achieved and the process negates the need for high temperatures and toxic solvents associated with existing methods. This gas-phase low temperature process is completely dry and, thus, minimises re-aggregation of graphene flakes which is typically associated with liquid phase reduction methods. The resulting material has many potential uses, particularly in electrochemical energy.
Author's Homepage:
http://people.tcd.ie/mcevoyniDescription:
PUBLISHED
Author: MCEVOY, NIALL
Type of material:
Journal ArticleSeries/Report no:
Journal of Materials Chemistry A1
Availability:
Full text availableKeywords:
GrapheneSubject (TCD):
Nanoscience & MaterialsDOI:
http://dx.doi.org/10.1039/C3TA10337DMetadata
Show full item recordLicences: