Functionalization of graphene surfaces with downstream plasma treatments
Item Type:Journal Article
Citation:Niall McEvoy, Hugo Nolan, Nanjundan Ashok Kumar, Toby Hallam and Georg S. Duesberg, Functionalization of graphene surfaces with downstream plasma treatments, Carbon, 54, 2013, 283 - 290
NMcEvoy_grapheneplasma_carbon.pdf (Accepted for publication (author's copy) - Peer Reviewed) 1.016Mb
We report on an adjustable process for the functionalization of graphene surfaces with a downstream plasma source. The parameters of oxygen plasma treatments are modified such that oxygenated functionalities can be added to the surface of graphene films prepared by chemical vapour deposition in a controlled manner. The nature of induced defects is investigated thoroughly using Raman and x-ray photoelectron spectroscopy. A massivechange in the surface properties is observed through the use of contact angle and electrochemical measurements. We propose the usage of such plasma treatments to facilitate the addition of further functional groups to the surface of graphene. The incorporation of nitrogen in to the graphene lattice by substitution of oxygenated functional groups is demonstrated outlining the validity of this approach for further functionalization.
Type of material:Journal Article
Availability:Full text available
Subject (TCD):Nanoscience & Materials