The Effect of Downstream Plasma Treatments on Graphene Surfaces
MC EVOY, NIALL
DUESBERG, GEORG STEFAN
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Citation:Nikolaos Peltekis, Shishir Kumar, Niall McEvoy, Kangho Lee, Anne Weidlich, Georg S. Duesberg, The Effect of Downstream Plasma Treatments on Graphene Surfaces, Carbon, 50, 2, 2012, 395-403
This paper reports on the effects of growth, transfer and annealing procedures on graphene grown by chemical vapour deposition. A combination of Raman spectroscopy, electrical measurements, atomic force microscopy, and x-ray photoemission spectroscopy allowed for the study of inherent characteristics and electronic structure of graphene films. Contributions from contaminants and surface inhomogeneities such as ripples were also examined. A new cleaning and reconstruction process for graphene, based on plasma treatments and annealing is presented, opening a new pathway for control over the surface chemistry of graphene films. The method has been successfully used on contacted graphene samples, demonstrating its potential for in-situ cleaning, passivation and interface engineering of graphene devices.
Science Foundation Ireland
Irish Research Council for Science Engineering and Technology