Gas phase controlled deposition of high quality large-area graphene films
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Journal ArticleDate:
2010Access:
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Kumar, S., McEvoy, N., Lutz, T., Keeley, G.P., Nicolosi, V., Murray, C.P., Blau, W.J., Duesberg, G.S., Gas phase controlled deposition of high quality large-area graphene films, Chemical Communications, 46, 9, 2010, 1422-1424Download Item:
b919725g.pdf (Published (publisher's copy)) 1018.Kb
Abstract:
A gas phase controlled graphene synthesis resembling a CVD process that does not critically depend on cooling rates is reported. The controllable catalytic CVD permits high quality large-area graphene formation with deft control over the thickness from monolayers to thick graphitic structures at temperatures as low as 750 ?C
Author's Homepage:
http://people.tcd.ie/nicolovhttp://people.tcd.ie/wblau
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PUBLISHED
Author: BLAU, WERNER; NICOLOSI, VALERIA
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Journal ArticleSeries/Report no:
Chemical Communications46
9
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Full text availableKeywords:
grapheneDOI:
http://dx.doi.org/10.1039/b919725gISSN:
13597345Licences: