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Please use this identifier to cite or link to this item: http://hdl.handle.net/2262/60693

Title: The Effect of Downstream Plasma Treatments on Graphene Surfaces
Author: LEE, KANGHO
DUESBERG, GEORG STEFAN
Sponsor: 
Name Grant Number
08/CE/I1432.

Author's Homepage: http://people.tcd.ie/duesberg
http://people.tcd.ie/leek1
Keywords: Physical chemistry
graphene
Issue Date: 2011
Citation: Nikolaos Peltekis, Shishir Kumar, Niall McEvoy, Kangho Lee, Anne Weidlich, Georg S. Duesberg, The Effect of Downstream Plasma Treatments on Graphene Surfaces, Carbon, 50, 2, 2011, 395-403
Series/Report no.: Carbon
50
2
Abstract: This paper reports on the effects of growth, transfer and annealing procedures on graphene grown by chemical vapour deposition. A combination of Raman spectroscopy, electrical measurements, atomic force microscopy, and x-ray photoemission spectroscopy allowed for the study of inherent characteristics and electronic structure of graphene films. Contributions from contaminants and surface inhomogeneities such as ripples were also examined. A new cleaning and reconstruction process for graphene, based on plasma treatments and annealing is presented, opening a new pathway for control over the surface chemistry of graphene films. The method has been successfully used on contacted graphene samples, demonstrating its potential for in-situ cleaning, passivation and interface engineering of graphene devices.
Description: PUBLISHED
URI: http://hdl.handle.net/2262/60693
Related links: http://dx.doi.org/10.1016/j.carbon.2011.08.052
Appears in Collections:Chemistry (Scholarly Publications)

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