P. Rainey, Joanna Wasyluk, Tatiana Perova, Richard Hurley, Neil Mitchell, David McNeill, Harold Gamble, and Mervyn Armstrong, Micro-Raman and spreading resistance analysis on bevelled implanted germanium for layer transfer applications, Electrochemical and Solid-State Letters, 14, 2, 2011, H69-H72
Electrochemical and Solid-State Letters; 14; 2;
Raman and spreading resistance profiling have been used to analyze defects in germanium caused by hydrogen and helium
implants, of typical fluences used in layer transfer applications. Beveling has been used to facilitate probing beyond the laser
penetration depth. Results of Raman mapping along the projection area reveal that after post-implant annealing at 400°C, some
crystal damage remains, while at 600°C, the crystal damage has been repaired. Helium implants create acceptor states beyond the
projected range, and for both hydrogen and helium, 1 1016 acceptors/cm2 remain after 600°C. These are thought to be vacancyrelated
point defect clusters.
Please note: There is a known bug in some browsers that causes an
error when a user tries to view large pdf file within the browser window.
If you receive the message "The file is damaged and could not be
repaired", please try one of the solutions linked below based on the
browser you are using.
Items in TARA are protected by copyright, with all rights reserved, unless otherwise indicated.