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Please use this identifier to cite or link to this item: http://hdl.handle.net/2262/40645

Title: The effect of deposition power on the electrical properties of Al-doped zinc oxide thin films
Author: WU, HAN-CHUN
SHVETS, IGOR
Sponsor: Science Foundation Ireland
Author's Homepage: http://people.tcd.ie/ivchvets
http://people.tcd.ie/wuh2
Keywords: Condensed matter physics
thin films
Issue Date: 2010
Citation: Chun, BS, Wu, HC, Abid, M, Chu, IC, Serrano-Guisan, S, Shvets, IV, Choi, DS, The effect of deposition power on the electrical properties of Al-doped zinc oxide thin films, Applied Physics Letters, 97, 8, 2010, 082109
Series/Report no.: Applied Physics Letters
97
8
Abstract: We investigated the effect on the electronic properties of aluminum (Al)-zinc oxide (ZnO) films by modulating the radio frequency sputtering power. Our experimental results show that increasing the sputtering power increases the Al doping concentration, decreases the resistivity, and also shifts the Zn 2p and O 1s to higher binding energy states. Our local-density approximation (LDA) and LDA+U calculations show that the shift in higher binding energy and resistivity decrease are due to an enhancement of the O 2p-Zn 3d coupling and the modification of the Zn 4s-O 2p interaction in ZnO induced by Al doping.
Description: PUBLISHED
URI: http://hdl.handle.net/2262/40645
Related links: http://dx.doi.org/10.1063/1.3483232
Appears in Collections:Physics (Scholarly Publications)

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