TARA: Boron diffusion in magnetic tunnel junctions with MgO (001) barriers and CoFeB electrodes

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Please use this identifier to cite or link to this item: http://hdl.handle.net/2262/40617

Title:	Boron diffusion in magnetic tunnel junctions with MgO (001) barriers and CoFeB electrodes
Author:	RODE, KARSTEN FAULKNER, COLM BOESE, MARKUS COEY, JOHN MICHAEL DAVID KURT, HUSEYIN OGUZ, KAAN
Sponsor:	Science Foundation Ireland
Author's Homepage:	http://people.tcd.ie/jcoey http://people.tcd.ie/rodek http://people.tcd.ie/cfaulkne http://people.tcd.ie/boesem http://people.tcd.ie/kurth
Keywords:	Atomic, molecular and chemical physics CoFeB MgO
Issue Date:	2010
Citation:	Kurt, H, Rode, K, Oguz, K, Boese, M, Faulkner, CC, Coey, JMD, Boron diffusion in magnetic tunnel junctions with MgO (001) barriers and CoFeB electrodes, Applied Physics Letters, 96, 26,, 2010, 262501
Series/Report no.:	Applied Physics Letters 96 26,
Abstract:	Boron diffusion out of the CoFeB layers in model systems with thick CoFeB and MgO layers grown by radiofrequency sputtering or electron-beam evaporation and in MgO-based magnetic tunnel junctions (MTJs) is probed after annealing by x-ray photoemission spectroscopy (XPS) and electron energy loss spectroscopy. Successive interfaces are exposed by ion milling the stacks, layer by layer, in the XPS system. Despite the presence of thick CoFeB and a high annealing temperature of 400 degrees C, we found no boron in the MgO or at the MgO/CoFe interfaces. Similar results are also obtained in the MTJs.
Description:	PUBLISHED
URI:	http://hdl.handle.net/2262/40617
Appears in Collections:	Physics (Scholarly Publications)

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