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Title: Raman investigation of different polytypes in SiC thin films grown by solid-gas phase epitaxy on Si (111) and 6H-SiC substrates
Sponsor: Irish Research Council for Science Engineering and Technology
Author's Homepage:
Keywords: Raman spectroscopy
solid-gas phase epitaxy
Raman enhancement
Issue Date: 2010
Citation: J. Wasyluk, T.S. Perova, S.A. Kukushkin, A.V. Osipov, N.A. Feoktistov, S.A. Grudinkin, Raman investigation of different polytypes in SiC thin films grown by solid-gas phase epitaxy on Si (111) and 6H-SiC substrates, Materials Science Forum, 645-648, 2010, 359 - 362
Series/Report no.: Materials Science Forum
Abstract: Raman spectroscopy was applied to investigate a series of SiC films grown on Si and 6HSiC substrates by a new method of solid gas phase epitaxy. During the growth characteristic voids are formed in Si at the SiC/Si interface. Raman peak position, intensity and linewidth were used to characterize the quality and the polytype structure of the SiC layers. A large enhancement in the peak intensity of the transverse optical and longitudinal optical phonon modes of SiC is observed for the Raman signal measured at the voids. In addition, scanning electron microscopy and atomic force microscopy were used to investigate the surface morphology of SiC layers.
Description: PUBLISHED
Appears in Collections:Electronic & Electrical Eng (Scholarly Publications)

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