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Please use this identifier to cite or link to this item: http://hdl.handle.net/2262/33107

Title: Annealing effect on tunneling magnetoresistance in MgO-based magnetic tunnel junctions with FeMn exchange-bias layer
Author: COEY, JOHN MICHAEL DAVID
FENG, JIA-FENG
Sponsor: Science Foundation Ireland
Author's Homepage: http://people.tcd.ie/jcoey
http://people.tcd.ie/jfeng
Keywords: Magnetic tunnel junctions (MTJs); Inverted and normal tunneling magnetoresistance (TMR); Elemental diffusion
Issue Date: 2010
Citation: Q.L. Ma, J.F. Feng, Gen Feng, K. Oguz, X.F. Han and J.M.D. Coey, Annealing effect on tunneling magnetoresistance in MgO-based magnetic tunnel junctions with FeMn exchange-bias layer, Journal of Magnetism and Magnetic Materials, 322, 1, 2010, 108-111
Series/Report no.: Journal of Magnetism and Magnetic Materials
322
1
Abstract: MgO-based magnetic tunnel junctions were fabricated, with a thin pinned CoFeB layer in the unbalanced synthetic antiferromagnet part of the stack FeMn/CoFe/Ru/CoFeB. Inverted and normal tunneling magnetoresistance (TMR) values occur at low and high annealing temperatures (Ta), respectively. The TMR ratio remains inverted up to Ta=300 °C and it becomes normal around Ta=350 °C. The exchange bias of FeMn disappears at high Ta. The sign reversal of the TMR ratio is mainly attributed to the disappearance of the exchange bias due to manganese diffusion during the annealing process.
Description: PUBLISHED
URI: http://dx.doi.org/10.1016/j.jmmm.2009.08.038
http://hdl.handle.net/2262/33107
Appears in Collections:Physics (Scholarly Publications)

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