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Please use this identifier to cite or link to this item: http://hdl.handle.net/2262/31888

Title: Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling
Author: COEY, JOHN MICHAEL DAVID
Sponsor: Science Foundation Ireland
Author's Homepage: http://people.tcd.ie/jcoey
Keywords: Physics
Issue Date: 2006
Publisher: American Institute of Physics
Citation: HX Wei, RM Langford, XF Han, JMD Coey 'Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling' in Journal of Applied Physics, 99, (8), 2006, 08C501
Series/Report no.: Journal of Applied Physics
99
8
Abstract: A method for the controlled fabrication of a nickel perpendicular nanocontact with diameters less than 5 nm is reported. The method involves milling pores through the 100 nm thick silicon nitride membrane using a focused ion beam, and depositing thin Ni film on the both side of the silicon nitride membrane. The shape of the resulting pore and nanocontact size is determined by the initial hole size and redeposition of the sputtered material onto the sidewalls of the holes. A sub-5 nm Ni nanocontact was prepared and the I-V and R-H characteristics measured.
Description: PUBLISHED
URI: http://dx.doi.org/10.1063/1.2150389
http://hdl.handle.net/2262/31888
Appears in Collections:Physics (Scholarly Publications)

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