HX Wei, RM Langford, XF Han, JMD Coey 'Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling' in Journal of Applied Physics, 99, (8), 2006, 08C501
Journal of Applied Physics 99 8
A method for the controlled fabrication of a nickel perpendicular nanocontact with diameters less
than 5 nm is reported. The method involves milling pores through the 100 nm thick silicon nitride
membrane using a focused ion beam, and depositing thin Ni film on the both side of the silicon
nitride membrane. The shape of the resulting pore and nanocontact size is determined by the initial
hole size and redeposition of the sputtered material onto the sidewalls of the holes. A sub-5 nm Ni
nanocontact was prepared and the I-V and R-H characteristics measured.
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