Suppression of the metal-insulator transition in magnetron sputtered Ti2O3 films
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Journal ArticleDate:
2020Access:
openAccessCitation:
Shvets P.V., Caffrey D., Fleischer K., Shvets I., O'Neill K., Duesberg G.S., Vinichenko A.N., Yu. Maksimova K., Yu. Goikhman A., Suppression of the metal-insulator transition in magnetron sputtered Ti2O3 films, Thin Solid Films, 694, 2020Download Item:
Suppression of the metal-insulator transition in magnetron sputtered Ti2O3films.pdf (Pre-print (author's copy) - Non-Peer Reviewed) 740.6Kb
Abstract:
We report on the synthesis of titanium suboxide films using a magnetron sputtering
setup. The structure of the produced films is characterized using Raman spectroscopy and X-ray
diffraction and electrical properties are measured by four-probe method. We demonstrate that
depending on the oxidation rate of the growing films it is possible to produce polycrystalline α-
TiO, corundum and orthorhombic Ti2O3 or almost amorphous TiO2. We focus on the
characterization of the two phases of Ti2O3 and show that their structure and electrical properties
significantly differ from earlier results obtained for bulk crystals or epitaxial films. Our
corundum-type Ti2O3 films have high electrical conductivity (compared to the bulk) and no
metal-insulator phase transition: the material is locked in the metallic state. The conductivity of
our orthorhombic Ti2O3 is lower compared to epitaxial films; this phase does not demonstrate
any phase transitions as well.
URI:
https://www.sciencedirect.com/science/article/pii/S0040609019306698?via%3Dihubhttp://hdl.handle.net/2262/91314
Sponsor
Grant Number
Science Foundation Ireland (SFI)
SFI/12/RC/2278
Science Foundation Ireland (SFI)
15/ IA/3131
Science Foundation Ireland (SFI)
12/IA/1264
Author's Homepage:
http://people.tcd.ie/caffredahttp://people.tcd.ie/duesberg
http://people.tcd.ie/ivchvets
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Journal ArticleURI:
https://www.sciencedirect.com/science/article/pii/S0040609019306698?via%3Dihubhttp://hdl.handle.net/2262/91314
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Series/Report no:
Thin Solid Films694
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Full text availableKeywords:
Titanium suboxides, Ti203, Magnetron sputtering, Thin films, Raman scattering, TiO, Metal-insulator phase transitionsDOI:
http://dx.doi.org/10.1016/j.tsf.2019.137642ISSN:
00406090Licences: