Single-crystal silicon/silicon dioxide multilayer heterostructures based on nanomembrane transfer
Citation:
Peng, WN, Roberts, MM, Nordberg, EP, Flack, FS, Colavita, PE, Hamers, RJ, Savage, DE, Lagally, MG, Eriksson, MA, Single-crystal silicon/silicon dioxide multilayer heterostructures based on nanomembrane transfer, APPLIED PHYSICS LETTERS, 90, 2007, 183107-Download Item:
1.2734367.pdf (PDF) 523.6Kb
Abstract:
A method to fabricatesingle-crystalSi/SiO2multilayerheterostructures is presented. Heterostructures are fabricated by repeated transfer of single crystalsiliconnanomembranes alternating with deposition of spin-on-glass. Nanomembrane transfer produces multilayers with low surface roughness and smooth interfaces. To demonstrate interface quality, the specular reflectivities of one-, two-, and three-membrane heterostructures are measured. Comparison of the measured reflectivity with theoretical calculations shows good agreement. Nanomembrane stacking allows for the preprocessing of individual membranes with a high thermal budget before the low thermal budget assembly of the stack, suggesting a new avenue for the three dimensional integration of integrated circuits.
Author's Homepage:
http://people.tcd.ie/colavitpDescription:
PUBLISHED
Author: COLAVITA, PAULA
Type of material:
Journal ArticleCollections:
Series/Report no:
APPLIED PHYSICS LETTERS90
Availability:
Full text availableKeywords:
Heterojunctions, ReflectivityDOI:
http://dx.doi.org/10.1063/1.2734367Licences: