Sort by: Order: Results:

Now showing items 1-1 of 1

  • Fabrication of ultra-shallow boron junctions using proximity rapid thermal diffusion 

    Nolan, Martina (Trinity College (Dublin, Ireland). Department of Electronic & Electrical Engineering, 2000)
    This work presents proximity rapid thermal diffusion (RTD) as a technique for fabricating shallow p-type junctions for LDD devices. Boron-doped spin-on dopant (SOD) is used as a dopant source in proximity RTD. Fourier ...