Mechanical aspects of nanoimprint patterning
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2003Citation:
Cross, G.L.W. O'Connell, B. Pethica, J.B. Oliver, W. `Mechanical aspects of nanoimprint patterning? in Proceedings of Third IEEE Conference on Nanotechnology, 2003., 12-14 Aug., 2, IEEE, 2003, pp 494-497Download Item:

Abstract:
Nanoimprinting is a high resolution, parallel
nanopatterning technique where, typically, a rigid stamp is
brought into contact with a thin polymer film and pattern transfer
achieved by the application of force and heat. The detailed
mechanics of the deformation of thin film polymer layers during
imprint by simple stamp geometries has not been reported. We
report here measurements of various mechanical aspects of the
nanoimprint process, including forces during the deformation and
mechanical properties of the resultant structures. Master designs
were realized in spherical blank indenters by focused ion beam
milling. Deformation was measured during displacement and load
controlled imprinting by a temperature controlled nanoindenter
above and below the glass transition region of the polymer. The
role of residual stresses in pattern transfer fidelity for isothermal
stamping is shown.
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Science Foundation Ireland
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